The effect of helium plasma etching on polymer-based optoelectronic devices

Thin Solid Films

Volumn 517, Issue 19, 2009, Pages 5743-5746

  Chambers, David Keith ^a   Raut, Brijesh ^a   Qi, Difei ^a   O'Neal, Chad B ^a   Selmic, Sandra Zivanovic ^a  

^a LOUISIANA TECH UNIVERSITY   (United States)

Author keywords

Etching; Optoelectronic devices; Organic semiconductors; Polymers

Indexed keywords

EMISSION SPECTRUMS; ETHYLENEDIOXYTHIOPHENE; EXTERNAL QUANTUM EFFICIENCY; FLUORENYL; HELIUM PLASMAS; ION ETCHING; MEH-PPV; METHOXY; ORGANIC SEMICONDUCTORS; PHENYLENEVINYLENE; POLY(STYRENE SULFONATE); REACTIVE ION; WORKING DEVICE;

CONDUCTING POLYMERS; CONJUGATED POLYMERS; ELECTROOPTICAL DEVICES; EMISSION SPECTROSCOPY; HELIUM; LIGHT EMISSION; LIGHT EMITTING DIODES; OPTOELECTRONIC DEVICES; ORGANIC LIGHT EMITTING DIODES (OLED); ORGANIC POLYMERS; PHOTODETECTORS; PLASMA DIAGNOSTICS; PLASMA ETCHING; PLASMAS; POLYMERS; SEMICONDUCTING ORGANIC COMPOUNDS;

REACTIVE ION ETCHING;

EID: 66049096009     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.03.199     Document Type: Article

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