Contact mask optimization and SRAF design

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7274, Issue , 2009, Pages

  Schroeder, Uwe P ^a   Tabery, Cyrus ^a   Morgenfeld, Bradley ^a   Kanai, Hideki ^a  

^a IBM RESEARCH   (United States)

Author keywords

Contacts; Off axis; OPC; SRAF

Indexed keywords

AERIAL IMAGES; ASSIST FEATURES; CD UNIFORMITY; CD VARIATION; CMOS TECHNOLOGY; CONTACT HOLES; CONTACT MASKS; CONTACTS; CRITICAL ELEMENTS; FORBIDDEN PITCH; LOGIC PATTERNS; MASK ERROR; MODEL-BASED; OFF-AXIS; OFF-AXIS ILLUMINATION; OPC; OPTICAL PROXIMITY CORRECTIONS; PATTERNING PROCESS; PROCESS WINDOW; SRAF; SUB-RESOLUTION ASSIST FEATURE; THROUGH PITCH; TOLERANCE BUDGET;

CMOS INTEGRATED CIRCUITS; OPTICAL RESOLVING POWER;

OPTIMIZATION;

EID: 65849368881     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.814814     Document Type: Conference Paper

References (3)

1. Y. Granik et al., Proc. of SPIE Vol. 6924, 69243W (2008)
2. E. Hendrickx et. al., Proc. of SPIE Vol. 6924, 69240L (2008)
3. S. Prins et. al., Proc. of SPIE Vol. 6925, 69250E (2008)