Reflection control in hyper-NA immersion lithography

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 6924, Issue , 2008, Pages

  Zhu, Zhimin ^a   Piscani, Emil ^b   Edwards, Kevin ^a   Smith, Brian ^a  

^a BREWER SCIENCE INC   (United States)

^b Resist Test Center   (United States)

Author keywords

CD processing window; Effective reflectivity; Foot exposure (FE); Full diffraction model (FDM); Immersion; Optical phase shift

Indexed keywords

ARCHITECTURAL DESIGN; CADMIUM; CADMIUM COMPOUNDS; CLADDING (COATING); COATING TECHNIQUES; CRACK DETECTION; DATA STORAGE EQUIPMENT; FINITE ELEMENT METHOD; IRON; LITHOGRAPHY; OPTICAL DESIGN; PHASE SHIFT; REFLECTION; REFLECTIVE COATINGS; SODIUM; WAVES; WINDOWS;

BOTTOM ANTI REFLECTIVE COATING (BARC); BOTTOM REFLECTION; CRITICAL DIMENSION (CD); DEPTH-OF-FOCUS (DOF); DESIGN CRITERION; DIFFRACTION MODELS; EXPERIMENTAL RESULTS; EXPOSURE LATITUDE (EL); HYPER-NA; IMMERSION LITHOGRAPHY (IML); INTERNATIONAL SEMATECH (CO); MICROSTEPPER; NEW YORK (CO); OPTICAL MICRO LITHOGRAPHY; OPTICAL PHASE SHIFTING; RESIST TEST CENTER (RTC); SINGLE LAYERS; STANDING WAVE (SW);

PHOTORESISTS;

EID: 45449110218     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.772899     Document Type: Conference Paper

References (4)

1. Brewer, T., Carlson, R., and Arnold, J., "The Reduction of the Standing-Wave Effect in Positive Photoresists," Journal of Applied Photographic Engineering, vol. 7. no. 6, 184-186 (1981).
2. Guerrero, D.J., Smith, T., Kato, M., Kimura, S., and Enomoto, T., "Two-layer anti-reflection strategies for implant applications," Proceedings of SPIE, vol. 6153, 242-249 (2006).
3. He, L., Puligadda, R., Lowes, J., and Rich, M., "Bottom Anti-Reflective Coatings (BARCs) for 157-nm Lithography," Proceedings of SPIE: Advances in Resist Technology and Processing XXI, vol. 5376, 648-654 (2004).
4. Weimer, M., Wang, Y., Neef, C.J., Claypool, J., Edwards, K., and Zhu, Z., "Materials for and performance of multilayer lithographic schemes," Proceedings of SPIE, vol. 6519, 65192S-1 - 65192S-8 (2007).