Photocatalytic TiO2 thin film prepared by PE CVD at low temperature

Plasma Processes and Polymers

Volumn 4, Issue SUPPL.1, 2007, Pages

  Kolouch, Aleš ^a   Hájková, Pavlína ^a   Macková, Anna ^b   Horáková, Marta ^a   Houdková, Jana ^c   Špatenka, Petr ^a,d   Hucek, Stanislav ^d,e  

^a TECHNICAL UNIVERSITY OF LIBEREC   (Czech Republic)

^b NUCLEAR PHYSICS INSTITUTE   (Czech Republic)

^c INSTITUTE OF PHYSICS   (Czech Republic)

^d UNIVERSITY OF SOUTH BOHEMIA   (Czech Republic)

^e INSTITUTE OF PARASITOLOGY   (Czech Republic)

Author keywords

Photocatalytic effect; Plasma enhanced chemical vapor deposition (PECVD); Thin films; Titanium dioxide

Indexed keywords

ATOMIC FORCE MICROSCOPES; CRYSTALLINE STRUCTURE; DEPOSITION TEMPERATURES; EXPERIMENTAL CONDITIONS; ISO-PROPOXIDE; LOW ENERGIES; LOW TEMPERATURES; PHOTO-CATALYTIC; PHOTOCATALYTIC ACTIVITIES; PHOTOCATALYTIC EFFECT; PHOTOCATALYTIC PROPERTY; PHOTOINDUCED HYDROPHILICITY; PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITION (PECVD); SCANNING ELECTRON MICROSCOPES; SILICON SUBSTRATES; TIO; WORKING GAS;

ATOMIC FORCE MICROSCOPY; ATOMIC SPECTROSCOPY; DEPOSITION; FILM PREPARATION; HYDROPHILICITY; ION BOMBARDMENT; IONS; MICROSCOPES; OXYGEN; PHOTOCATALYSIS; PLASMA DEPOSITION; PLASMA DIAGNOSTICS; PLASMAS; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SCANNING ELECTRON MICROSCOPY; THIN FILMS; TITANIUM; TITANIUM DIOXIDE; TITANIUM OXIDES; VAPORS; X RAY DIFFRACTION; X RAY PHOTOELECTRON SPECTROSCOPY;

PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION;

EID: 65749118361     PISSN: 16128850     EISSN: 16128869     Source Type: Journal    
DOI: 10.1002/ppap.200730907     Document Type: Conference Paper

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