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Volumn 311, Issue 10, 2009, Pages 2929-2932
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InGaN growth with various InN mole fractions on m-plane ZnO substrate by metalorganic vapor phase epitaxy
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Author keywords
A1. Stresses; A3. Metalorganic vapor phase epitaxy; B1. Gallium compounds; B1. Zinc compounds; B2. Semiconducting III V materials
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Indexed keywords
A1. STRESSES;
A3. METALORGANIC VAPOR PHASE EPITAXY;
B1. GALLIUM COMPOUNDS;
B1. ZINC COMPOUNDS;
B2. SEMICONDUCTING III-V MATERIALS;
CRYSTAL GROWTH;
EPILAYERS;
GALLIUM ALLOYS;
GALLIUM NITRIDE;
METALLORGANIC VAPOR PHASE EPITAXY;
SEMICONDUCTING GALLIUM;
SEMICONDUCTING ZINC COMPOUNDS;
SEMICONDUCTOR GROWTH;
SILICON CARBIDE;
SUBSTRATES;
TRANSITION METAL COMPOUNDS;
VAPORS;
ZINC;
ZINC OXIDE;
EPITAXIAL GROWTH;
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EID: 65749108315
PISSN: 00220248
EISSN: None
Source Type: Journal
DOI: 10.1016/j.jcrysgro.2009.01.061 Document Type: Article |
Times cited : (2)
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References (10)
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