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Volumn 24, Issue 3, 2008, Pages 365-372

Plasma implantation for emitter and localized back surface field (BSF) formation in silicon solar cells

Author keywords

Low cost process; Plasma implantation; Silicon solar cell

Indexed keywords


EID: 65749098998     PISSN: 1450216X     EISSN: 1450202X     Source Type: Journal    
DOI: None     Document Type: Article
Times cited : (13)

References (15)
  • 5
    • 0019009121 scopus 로고
    • A study of the factors which control the efficiency of ion-implanted silicon solar cells
    • Douglas, E. C. and Daiello, R. V., 1980. "A study of the factors which control the efficiency of ion-implanted silicon solar cells ", IEEE Transaction on Electron Devices 27, 792-802
    • (1980) IEEE Transaction on Electron Devices , vol.27 , pp. 792-802
    • Douglas, E.C.1    Daiello, R.V.2
  • 6
    • 33744521492 scopus 로고    scopus 로고
    • European Photovoltaics in world wide comparison
    • Jäger-Waldau, A., 2006. " European Photovoltaics in world wide comparison", Journal of Non-Crystalline Solids, 352(9-20), pp. 1922-1927
    • (2006) Journal of Non-Crystalline Solids , vol.352 , Issue.9-20 , pp. 1922-1927
    • Jäger-Waldau, A.1
  • 11
    • 84919406868 scopus 로고    scopus 로고
    • Solarbuzz website
    • Solarbuzz website of the http://www.solarbuzz.com
  • 15
    • 0035368117 scopus 로고    scopus 로고
    • Characterization of Random Reactive Ion Etched-Textured Silicon Solar Cells
    • Saleem H. Zaidi, Ruby, D. S. and Gee, J. M., 2001. "Characterization of Random Reactive Ion Etched-Textured Silicon Solar Cells", IEEE Transaction on Electron Devices 48, 1200
    • (2001) IEEE Transaction on Electron Devices , vol.48 , pp. 1200
    • Zaidi, S.H.1    Ruby, D.S.2    Gee, J.M.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.