Annealing induced refinement on optical transmission and electrical resistivity of indium tin oxide

Chinese Optics Letters

Volumn 7, Issue 3, 2009, Pages 263-265

  Hsu, Wei Lun ^a   Lin, Cheng Tao ^a   Cheng, Tzu Huan ^a   Yen, Shih Chiang ^a   Liu, Chee Wee ^a   Tsai, Din Ping ^a   Lin, Gong Ru ^a  

^a NATIONAL TAIWAN UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

ANNEALING CONDITION; ELECTRICAL CONTACTS; ELECTRICAL PROPERTY; ELECTRICAL RESISTIVITY; INDIUM TIN OXIDE; INDIUM TIN OXIDE FILMS; ITO FILMS; OPTICAL TRANSMISSIONS; OPTICAL TRANSPARENCY; SHORTER WAVELENGTH; SURFACE CONDUCTANCE; ULTRA-VIOLET;

ATOMIC FORCE MICROSCOPY; ELECTRIC PROPERTIES; ELECTRIC RESISTANCE; INDIUM; OXIDE FILMS; OXIDE MINERALS; PHOTOLITHOGRAPHY; QUARTZ; TIN;

ANNEALING;

EID: 65749096692     PISSN: 16717694     EISSN: None     Source Type: Journal    
DOI: 10.3788/COL20090703.0263     Document Type: Article

References (7)

1. S. A. Carter, M. Angelopoulos, S. Karg, P. J. Brock, and J. C. Scott, Appl. Phys. Lett. 70, 2067 (1997).
2. F. Li, H. Tang, J. Shinar, O. Resto, and S. Z. Weisz, Appl. Phys. Lett. 70, 2741 (1997).
3. J. Pla, M. Tamasi, R. Rizzoli, M. Losurdo, E. Centurioni, C. Summonte, and F. Rubinelli, Thin Solid Films 425, 185 (2003).
4. D.-H. Kim, M.-R. Park, and G.-H. Lee, Surf. Coat. Technol. 201, 927 (2006).
5. A. De, P. K. Biswas, and J. Manara, Mater. Character. 58, 629 (2007).
6. D. Kim, Y. Han, J.-S. Cho, and S.-K. Koh, Thin Solid Films 377-378, 81 (2000).
7. A. Khodorov, M. Piechowiak, and M. J. M. Gomes, Thin Solid Films 515, 7829 (2007).