SCOPUS 정보 검색 플랫폼

Thin Solid Films

Volumn 517, Issue 17, 2009, Pages 4921-4925

Optimization of sputtered Cr/Au thin film for diaphragm-based MEMS applications

(2) Tan, Chee Wee a,b Miao, Jianmin a

a NANYANG TECHNOLOGICAL UNIVERSITY (Singapore)

b SINGAPORE MIT ALLIANCE FOR RESEARCH AND TECHNOLOGY (Singapore)

Author keywords

Cr Au thin film; Diaphragm; MEMS; Sputtering; Stress optimization

Indexed keywords

AIR-GAP; CAPACITANCE CHANGE; COMPRESSIVE FILMS; CR/AU THIN FILM; DEVICE CHARACTERIZATION; FABRICATED DEVICE; FILM STRESS; LOW STRESS; MEMS APPLICATIONS; OPTIMIZATION STUDIES; PROCESS PRESSURE;

CAPACITANCE; DC-DC CONVERTERS; MEMS; MICROELECTROMECHANICAL DEVICES; MOLECULAR BEAM EPITAXY; OPTIMIZATION; SILICON NITRIDE; THIN FILM DEVICES; THIN FILMS;

DIAPHRAGMS;

EID: 65749095396 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2009.03.151 Document Type: Article

Times cited : (36)

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