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Volumn 27, Issue 3, 2009, Pages 521-530
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Influence of deposition pressure and pulsed dc sputtering on pumping properties of Ti-Zr-V nonevaporable getter films
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Author keywords
[No Author keywords available]
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Indexed keywords
ACCELERATOR VACUUMS;
AVERAGE GRAIN SIZES;
COLUMNAR STRUCTURES;
DEPOSITION CONDITIONS;
DEPOSITION PRESSURES;
FILM DEPOSITIONS;
FILM PROPERTIES;
FILM TOPOGRAPHIES;
ION ASSISTANCES;
LOW PRESSURES;
NON-EVAPORABLE GETTERS;
ORDER OF MAGNITUDES;
PULSED DC SPUTTERING;
PUMPING CAPACITIES;
PUMPING SPEED;
ROUGH SUBSTRATES;
SMOOTH SUBSTRATES;
SPUTTERING CONDITIONS;
STICKING PROBABILITIES;
SUBSTRATE MATERIALS;
SUBSTRATE SURFACES;
WORKING PRESSURES;
X-RAY PHOTOELECTRON SPECTROSCOPY STUDIES;
GETTERS;
ION BOMBARDMENT;
IONS;
PUMPS;
SURFACE PROPERTIES;
SURFACE ROUGHNESS;
X RAY PHOTOELECTRON SPECTROSCOPY;
ZIRCONIUM;
SUBSTRATES;
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EID: 65549164428
PISSN: 07342101
EISSN: None
Source Type: Journal
DOI: 10.1116/1.3112623 Document Type: Article |
Times cited : (44)
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References (15)
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