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Volumn 27, Issue 3, 2009, Pages 521-530

Influence of deposition pressure and pulsed dc sputtering on pumping properties of Ti-Zr-V nonevaporable getter films

Author keywords

[No Author keywords available]

Indexed keywords

ACCELERATOR VACUUMS; AVERAGE GRAIN SIZES; COLUMNAR STRUCTURES; DEPOSITION CONDITIONS; DEPOSITION PRESSURES; FILM DEPOSITIONS; FILM PROPERTIES; FILM TOPOGRAPHIES; ION ASSISTANCES; LOW PRESSURES; NON-EVAPORABLE GETTERS; ORDER OF MAGNITUDES; PULSED DC SPUTTERING; PUMPING CAPACITIES; PUMPING SPEED; ROUGH SUBSTRATES; SMOOTH SUBSTRATES; SPUTTERING CONDITIONS; STICKING PROBABILITIES; SUBSTRATE MATERIALS; SUBSTRATE SURFACES; WORKING PRESSURES; X-RAY PHOTOELECTRON SPECTROSCOPY STUDIES;

EID: 65549164428     PISSN: 07342101     EISSN: None     Source Type: Journal    
DOI: 10.1116/1.3112623     Document Type: Article
Times cited : (44)

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* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.