Electron beam lithography of V-shaped silver nanoantennas

Microelectronic Engineering

Volumn 86, Issue 4-6, 2009, Pages 1078-1080

  Klein, Michael F G ^a,b   Hein, Herbert ^a   Jakobs, Peter Jürgen ^a   Linden, Stefan ^a   Meinzer, Nina ^b   Wegener, Martin ^b   Saile, Volker ^a   Kohl, Manfred ^a  

^a KARLSRUHE INSTITUTE OF TECHNOLOGY   (Germany)

^b UNIVERSITY OF KARLSRUHE   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

ARGON-IONS; ATTENUATED TOTAL REFLECTIONS; CRITICAL DIMENSIONS; FABRICATION PROCESS; HYDROGEN-SILSESQUIOXANE; LIFT-OFF PROCESS; NANOANTENNAS; NOVEL PROCESS; OPTICAL ACTIVITIES; POLYMETHYLMETHACRYLATE; POSITIVE RESISTS; SEM;

ARGON; ELECTRON BEAMS; HYDROGEN;

ELECTRON BEAM LITHOGRAPHY;

EID: 65549094915     PISSN: 01679317     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mee.2008.12.023     Document Type: Article

References (8)

1. Barnes W.L., Dereux A., and Ebbesen T.W. Nature 424 (2003) 824
2. Stockman M.I., Faleev S.V., and Bergman D.J. Phys. Rev. Lett. 88 (2002) 67402
3. Bergman D.J., and Stockman M.I. Phys. Rev. Lett. 90 (2003) 27402
4. Novotny L., Bian R.X., and Xie X.S. Phys. Rev. Lett. 79 (1997) 645
5. JCM SUITE by JCMwave GmbH, .
6. Meinzer N., Wegener M., Klein M.F.G., Jakobs P.-J., Hein H., König M., Niegemann J., Busch K., Feth N., and Linden S. QELS (2008) 1
7. Maile B.E., Henschel W., Kurz H., Rienks B., Polman R., and Kaars P. Jpn. J. Appl. Phys. (2000) 6836
8. Henschel W., Georgiev Y.M., and Kurz H. J. Vac. Sci. Technol. B (2003) 2018