Kinetics of Surface-Induced Dissociation of N(CH3)4+ and N(CD3)4+ Using Silicon Nanoparticle Assisted Laser Desorption/Ionization and Laser Desorption/Ionization

Journal of the American Society for Mass Spectrometry

Volumn 20, Issue 6, 2009, Pages 957-964

  Yoon, Sung Hwan ^a   Gamage, Chaminda M ^a   Gillig, Kent J ^a   Wysocki, Vicki H ^a  

^a University of Arizona   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

COLLISION ENERGIES; DISSOCIATION KINETICS; DISSOCIATION MECHANISMS; DISSOCIATION PATHWAYS; DISSOCIATION RATES; FRAGMENT IONS; INITIAL ENERGIES; INTERNAL ENERGIES; KINETICS STUDIES; LASER DESORPTION IONIZATIONS; LASER DESORPTION/IONIZATION; MALDI MATRIXES; MALDI-TOF; METHYL RADICALS; PEAK SHAPE ANALYSIS; RRKM CALCULATIONS; SILICON NANOPARTICLES; SMALL MOLECULES; SUB MICROSECONDS; SURFACE-INDUCED DISSOCIATIONS; TIME-SCALE; UNIMOLECULAR DECAYS;

AMINES; DESORPTION; IONS; LASERS; NANOPARTICLES; SELF ASSEMBLED MONOLAYERS;

DISSOCIATION;

HYDROGEN; ION; NANOPARTICLE; SELF ASSEMBLED MONOLAYER; SILICON;

ARTICLE; DEGRADATION KINETICS; DESORPTION; DISSOCIATION; ENERGY; FLUORINATION; FRAGMENTATION REACTION; IONIZATION; MATRIX ASSISTED LASER DESORPTION IONIZATION TIME OF FLIGHT MASS SPECTROMETRY; MOLECULAR MECHANICS; SURFACE PROPERTY;

EID: 65549086519     PISSN: 10440305     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jasms.2009.03.001     Document Type: Article

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