Investigation of the structure of thin HfO2 films by soft x-ray reflectometry techniques

Journal of Physics Condensed Matter

Volumn 21, Issue 18, 2009, Pages

  Filatova, E O ^a   Sokolov, A A ^a   Kozhevnikov, I V ^b   Taracheva, E Yu ^a   Grunsky, O S ^a   Schaefers, F ^c   Braun, W ^c  

^a ST PETERSBURG STATE UNIVERSITY   (Russian Federation)

^b SHUBNIKOV INSTITUTE OF CRYSTALLOGRAPHY   (Russian Federation)

^c HAHN MEITNER INSTITUT   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS PHASE; CRYSTALLINE STRUCTURES; DEPTH DISTRIBUTIONS; FILM MICROSTRUCTURES; MICROSTRUCTURE OF FILMS; MOCVD; REFLECTION SPECTROSCOPIES; REFLECTIVITY CURVES; SOFT X-RAYS; X-RAY DIFFRACTIONS;

CHEMICAL VAPOR DEPOSITION; HAFNIUM COMPOUNDS; MICROSTRUCTURE; REFLECTION; REFLECTOMETERS; THICK FILMS; X RAY DIFFRACTION;

CHEMICAL ELEMENTS;

EID: 65449177220     PISSN: 09538984     EISSN: 1361648X     Source Type: Journal    
DOI: 10.1088/0953-8984/21/18/185012     Document Type: Article

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