Structural and magnetic properties of Co-N thin films synthesized by direct current magnetron sputtering

Thin Solid Films

Volumn 517, Issue 15, 2009, Pages 4419-4424

  Wang, X ^a   Jia, H ^b   Zheng, W T ^a   Chen, Yan ^c   Feng, Shouhua ^c  

^a Jilin University   (China)

^b BEIHUA UNIVERSITY   (China)

^c JILIN UNIVERSITY   (China)

Author keywords

Co N; Coercivity; Nitrogen gas; Saturation magnetization; Sputtering

Indexed keywords

CO CONTENTS; CO FILMS; CO-N; COERCIVITY; DIRECT CURRENT MAGNETRON SPUTTERING; INTERSTITIAL NITROGENS; NITROGEN FRACTIONS; NITROGEN GAS; SPUTTERING POWER; STRUCTURAL AND MAGNETIC PROPERTIES;

COERCIVE FORCE; MAGNETISM; MAGNETRONS; MAGNETS; NITROGEN; PLASMAS; SATURATION MAGNETIZATION; SODIUM COMPOUNDS; THIN FILMS;

COBALT;

EID: 65449121886     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.03.171     Document Type: Article

References (19)

1. Peng D.L., Sumiyama K., and Suzuki K. J. Alloys Compd. 255 (1997) 50
2. Naganuma H., Nakatani R., Endo Y., Kawamura Y., and Yamamoto M. Sci. Technol. Adv. Mater. 5 (2004) 101
3. coey J.M.D., and Smith P.A.I. J. Magn. Magn. Mater. 200 (1999) 405
4. Chandran M., Iorio L.E., and Subramanian P.R. J. Appl. Phys. 101 (2007) 033912
5. Suzuki K., Kaneko T., Yoshida H., Morita H., and Fujimori H. J. Alloys Compd. 224 (1995) 232
6. Maya L., Paranthaman M., Thompson J.R., Thundat T., and Stevenson R.J. J. Appl. Phys. 79 (1996) 7905
7. Matsuoka M., and Ono K. Appl. Phys. Lett. 49 (1986) 1644
8. Fang J.S., Yang L.C., Hsu C.S., Chen Y.S., Lin Y.W., and Chen S.S. J. Vac. Sci. Technol. A 22 (2004) 698
9. Hasegawa M., and Yagi T. Solid State Commun. 135 (2005) 294
10. Asahara H., Migita T., Tanaka T., and Kawabata K. Vacuum 62 (2001) 293
11. Matsuoka M., Ono K., and Inukai T. Appl. Phys. Lett. 49 (1986) 977
12. Oda K., Yoshio T., and Oda K. J. Mater. Sci. 22 (1987) 2729
13. Shih K.K., and Karasinski J. J. Appl. Phys. 73 (1993) 8377
14. Mater S.F., Houari A., and Belkhir M.A. Phys. Rev. B 75 (2007) 245109
15. Jia H., Wang X., Zheng W.T., Chen Y., and Feng S.H. Mater. Sci. Eng., B 150 (2008) 121
16. Shih K.K., Re M.E., and Dove D.B. Appl. Phys. Lett. 57 (1990) 412
17. Herzer G. IEEE Trans. Magn. 26 (1990) 1397
18. Gupta R., and Gupta M. Phys. Rev. B 72 (2005) 024202
19. Cowburn R.P., Koltsov D.K., Adeyeye A.O., and Welland M.E. Europhys. Lett. 48 (1999) 221