Synthesis and characteristics of nanocrystalline Co/N thin film containing Co4N phase

Materials Science and Engineering: B

Volumn 150, Issue 2, 2008, Pages 121-124

  Jia, Hui ^a,b   Wang, Xin ^a   Zheng, Weitao ^a   Chen, Yan ^c   Feng, Shouhua ^c  

^a MOE   (China)

^b BEIHUA UNIVERSITY   (China)

^c Jilin University   (China)

Author keywords

Co4N; Magnetic properties; Nanocrystalline; Sputtering

Indexed keywords

MAGNETRON SPUTTERING; NANOCRYSTALLINE MATERIALS; QUANTUM INTERFERENCE DEVICES; SATURATION MAGNETIZATION; X RAY DIFFRACTION ANALYSIS; X RAY PHOTOELECTRON SPECTROSCOPY;

DOMINATION ORIENTATION; IN-PLANE ANISOTROPY; MAGNETIC ANALYSIS;

THIN FILMS;

EID: 44349100277     PISSN: 09215107     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.mseb.2008.03.001     Document Type: Article

References (25)

1. Yamaguchi T., Sakita M., Nakamura M., and Kobira T. J. Magn. Magn. Mater. 215-216 (2000) 529
2. Costa-Krämer J.L., Borsa D.M., García-Martín J.M., Martín-González M.S., Boerma D.O., and Briones F. Phys. Rev. B 69 (2004) 144402
3. Zheng W.T., and Sun C.Q. Prog. Solid State Chem. 34 (2006) 1
4. Borsa D.M., Grachev S., Presura C., and Boerma D.O. Appl. Phys. Lett. 80 (2002) 1823
5. Loloee R., Nikolaev K.R., and Pratt Jr. W.P. Appl. Phys. Lett. 82 (2003) 3281
6. Matsuoka M., Ono K., and Inukai T. App. Phys. Lett. 49 (1986) 977
7. Fang J.S., Yang L.C., Hsu C.S., Chen Y.S., Lin Y.W., and Chen S.S. J. Vac. Sci. Technol. A 22 (2004) 698. (and the references therein)
8. Mater S.F., Houari A., and Belkhir M.A. Phys. Rev. B 75 (2007) 245109
9. Oda K., Yoshio T., and Oda K. J. Mater. Sci. 22 (1987) 2729
10. Bate G. Ferromagnetic Materials, first (1980), North-Holland, Amsterdam New York Oxford
11. Coey J.M.D. J. Alloy. Compd. 326 (2001) 2
12. Maya L., Paranthaman M., Thompson J.R., Thundat T., and Stevenson R.J. J. Appl. Phys. 79 (1996) 7905
13. Shih K.K., and Karasinski J. J. Appl. Phys. 73 (1993) 8377
14. Xu W., Wang X., Feng S.H., and Zheng W.T. Chem. J. Chin. Univ. 25 (2004) 200
15. Wang L.L., Wang X., Zheng W.T., and Ma N. J. Alloys Compd. 443 (2007) 43
16. Milad I.K., Smith K.J., Wong P.C., and Mitchell K.A.R. Catal. Lett. 52 (1998) 113
17. Vogt K.W., Naugher L.A., and Kohl P.A. Thin Solid Film 256 (1995) 106
18. Soto G., de la Cruz W., and Faŕi{dotless}as M.H. J. Electron Spectrosc. Relat. Phenome. 135 (2004) 27
19. Hada K., Nagai M., and Omi S. J. Phys. Chem. B 105 (2001) 4084
20. Suzuki K., Kaneko T., Yoshida H., Morita H., and Fujimori H. J. Alloys Compd. 224 (1995) 232
21. Modak P., Verma A.K., Rao R.S., Godwal B.K., and Jeanloz R. Phys. Rev. B 74 (2006) 012103
22. Steinmuller S.J., Vaz C.A.F., Stroem V., Moutafis C., Tse D.H.Y., Guertler C.M., Klaeui M., Bland J.A.C., and Cui Z. Phys. Rev. B 76 (2007) 054429
23. Childress J.R., and Chien C.L. Phys. Rev. B 43 (1991) 8089
24. Russak M.A., Jahnes C.V., Klokholm E., J-Won Lee M.E., Re B.C., and Webb. J. Magn. Magn. Mater. 104-107 (1992) 1851
25. Wang L.L., Wang X., Ma N., and Zheng W.T. Surf. Coat. Technol. 201 (2006) 786