Catalyst-free low-temperature growth of carbon nanofibers by microwave plasma-enhanced CVD

Thin Solid Films

Volumn 517, Issue 14, 2009, Pages 4264-4267

  Mori, S ^a   Suzuki, M ^a  

^a TOKYO INSTITUTE OF TECHNOLOGY   (Japan)

Author keywords

Carbon monoxide discharge; Carbon nanofibers; Catalyst free; Low temperature; Microwave plasma CVD

Indexed keywords

CARBON DEPOSITS; CATALYST MATERIALS; CATALYST-FREE; LINEAR GROWTHS; LOW-TEMPERATURE; LOW-TEMPERATURE GROWTHS; MICROWAVE PLASMA CVD; MICROWAVE PLASMA-ENHANCED CHEMICAL VAPOR DEPOSITIONS; MICROWAVE PLASMA-ENHANCED CVD; OXYGEN CONCENTRATIONS; VERTICALLY ALIGNED;

CARBON MONOXIDE; CARBON NANOFIBERS; CARBON NANOTUBES; CATALYSIS; CATALYSTS; ELECTRIC DISCHARGES; GROWTH (MATERIALS); MICROWAVES; OXYGEN; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMAS; SYNTHESIS (CHEMICAL);

AMORPHOUS CARBON;

EID: 65449115615     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.02.009     Document Type: Article

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