Low temperature limits of diamond film growth by microwave plasma-assisted CVD

Diamond and Related Materials

Volumn 5, Issue 3-5, 1996, Pages 226-230

  Stiegler, J ^a   Lang, T ^a   Nygard Ferguson M ^a   Von Kaenel, Y ^a   Blank, E ^a  

^a EPFL   (Switzerland)

Author keywords

Diamond; Low substrate temperature; Microwave plasma CVD; Surface

Indexed keywords

EID: 0000341350     PISSN: 09259635     EISSN: None     Source Type: Journal    
DOI: 10.1016/0925-9635(95)00349-5     Document Type: Article

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