A high sensitivity hall sensor fabricated on a SOI wafer using surface micromachining technique

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 7204, Issue , 2009, Pages

  Singh, Namit ^a   Estradaa, Horacio V ^a  

^a The University of North Carolina at Charlotte   (United States)

Author keywords

Flexible substrate.; Hall effect sensors; Polyimide; Silicon on insulator (SOI); Surface micromachining

Indexed keywords

ACTIVE LAYERS; ACTIVE REGIONS; BORON-DOPED; CURVED SURFACES; FABRICATION PROCESS; FABRICATION TECHNIQUES; FLEXIBLE SUBSTRATE.; HALL DEVICES; HALL EFFECT SENSORS; HALL PROBES; HALL SENSORS; HIGH SENSITIVITIES; MAGNETIC SENSITIVITIES; MICRO-ELECTRO MECHANICAL SYSTEMS; MICROMACHINING PROCESS; MICROMACHINING TECHNIQUES; P-TYPE SILICONS; RADIAL MAGNETIC FIELDS; SILICON-ON-INSULATOR (SOI); SOI WAFERS; TO CURVES; WET AND DRIES;

BORON; COMPOSITE MICROMECHANICS; GYRATORS; HALL EFFECT; HALL EFFECT DEVICES; MAGNETIC FIELD EFFECTS; MICROANALYSIS; MICROELECTROMECHANICAL DEVICES; MICROFABRICATION; MICROSENSORS; NONMETALS; POLYIMIDES; POLYMERS; SEMICONDUCTING SILICON COMPOUNDS; SILICON WAFERS; SUBSTRATES;

SURFACE MICROMACHINING;

EID: 65349157851     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.815203     Document Type: Conference Paper

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