Planarization of amorphous carbon films on patterned substrates using gas cluster ion beams

Journal of Applied Physics

Volumn 105, Issue 7, 2009, Pages

  Toyoda, Noriaki ^a   Nagato, Keisuke ^b   Tani, Hiroshi ^c   Sakane, Yasuo ^d   Nakao, Masayuki ^b   Hamaguchi, Tetsuya ^b   Yamada, Isao ^a  

^a UNIVERSITY OF HYOGO   (Japan)

^b UNIVERSITY OF TOKYO   (Japan)

^c KANSAI UNIVERSITY   (Japan)

^d WESTERN DIGITAL CORPORATION   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

AMORPHOUS CARBON FILMS; ATOMIC FORCE MICROSCOPES; DISCRETE TRACK MEDIAS; ENERGY DISPERSIVE X-RAY SPECTROSCOPIES; FLAT SURFACES; FREQUENCY DEPENDENCES; GAS CLUSTER ION BEAMS; LINE-AND-SPACE PATTERNS; MAGNETIC LAYERS; PATTERNED SUBSTRATES; PATTERNED SURFACES; PLANARIZATION; POWER SPECTRUM DENSITIES; SI SUBSTRATES; SURFACE PLANARIZATION; THICKNESS LOSS;

AMORPHOUS FILMS; AMORPHOUS SILICON; ATOMIC SPECTROSCOPY; CARBON CLUSTERS; CARBON FILMS; CHEMICAL MODIFICATION; ION BEAM ASSISTED DEPOSITION; ION BEAMS; IONS; IRRADIATION; POWER SPECTRUM; SPECTRUM ANALYSIS;

AMORPHOUS CARBON;

EID: 65249137530     PISSN: 00218979     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3073665     Document Type: Article

References (4)

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2. I. Yamada, J. Matsuo, N. Toyoda, and A. Kirkpatrick, Mater. Sci. Eng. R. 0927-796X 10.1016/S0927-796X(01)00034-1 34, 231 (2001).
3. N. Toyoda, N. Hagiwara, J. Matsuo, and I. Yamada, Nucl. Instrum. Methods Phys. Res. B 161-163, 980 (2000).
4. N. Toyoda, S. Houzumi, and I. Yamada, Nucl. Instrum. Methods Phys. Res. B 0168-583X 10.1016/j.nimb.2005.07.079 241, 609 (2005).