Computer simulation of the epitaxy of surfactant-templated inorganic nanomaterials on patterned surfaces

Langmuir

Volumn 25, Issue 4, 2009, Pages 1998-2006

  Li, Zheng ^a   Zhang, Xianren ^a   Chen, Biaohua ^b  

^a BEIJING UNIVERSITY OF POSTS AND TELECOMMUNICATIONS   (China)

^b BEIJING UNIVERSITY OF CHEMICAL TECHNOLOGY   (China)

Author keywords

[No Author keywords available]

Indexed keywords

CRITICAL VALUES; GROWTH PROCESS; INORGANIC COMPONENTS; INORGANIC MATERIALS; INORGANIC NANOMATERIALS; LATTICE MONTE CARLO; MACRO PHASE SEPARATIONS; NANO MATERIALS; NANO-METER SCALE; NUCLEATION SITES; PATTERN SIZES; PATTERNED SUBSTRATES; PATTERNED SURFACES; RING PATTERNS; SIMULATION RESULTS; SURFACTANT CONCENTRATIONS; TEMPLATED; WATER SYSTEMS;

AGGLOMERATION; CHEMICAL MODIFICATION; CRYSTAL GROWTH; MOLECULAR BEAM EPITAXY; MONTE CARLO METHODS; NANOSTRUCTURED MATERIALS; SUBSTRATES; SURFACE ACTIVE AGENTS; SURFACES;

EPITAXIAL GROWTH;

EID: 65249086143     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la803325c     Document Type: Article

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