Reliable low-cost fabrication of low-loss Al2O3 :Er3+ waveguides with 5.4-dB optical gain

IEEE Journal of Quantum Electronics

Volumn 45, Issue 5, 2009, Pages 454-461

  Wörhoff, Kerstin ^a   Bradley, Jonathan D B ^a   Ay, Feridun ^a   Geskus, Dimitri ^a   Blauwendraat, Tom P ^a,b   Pollnau, Markus ^a  

^a UNIVERSITY OF TWENTE   (Netherlands)

^b OTB Solar   (Netherlands)

Author keywords

Aluminum oxide; Erbium; Integrated optics; Low loss dielectric waveguide; Optical amplifier; Reactive cosputtering

Indexed keywords

ALUMINUM OXIDE; CHANNEL PROPAGATION; CHANNEL WAVEGUIDES; CO-SPUTTERING; DEPOSITION PROCESS; DOPANT LEVELS; HIGH QUALITIES; INTEGRATED OPTICAL DEVICES; ION DOPING; LAYER GROWTHS; LOW-COST FABRICATIONS; LOW-LOSS DIELECTRIC WAVEGUIDE; OPTICAL AMPLIFICATIONS; OPTICAL AMPLIFIER; OPTICAL FUNCTIONS; PROPAGATION LENGTHS; RARE-EARTH; REACTIVE COSPUTTERING; THICKNESS UNIFORMITIES; WAVELENGTH RANGES;

ALUMINA; AMPLIFICATION; DIELECTRIC WAVEGUIDES; DOPING (ADDITIVES); ELECTRIC LOSSES; ERBIUM; FABRICATION; INTEGRATED OPTICS; LIGHT AMPLIFIERS; OPTICAL GAIN; OPTICAL INSTRUMENTS; OPTICAL MATERIALS; OPTICAL SWITCHES; OPTOELECTRONIC DEVICES; OXIDES; PHOTONICS; PLASMA FILLED WAVEGUIDES;

ALUMINUM;

EID: 65149105317     PISSN: 00189197     EISSN: None     Source Type: Journal    
DOI: 10.1109/JQE.2009.2013365     Document Type: Article

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