Fabrication of suspended micro-structures using diffsuser lithography on negative photoresist

Journal of Mechanical Science and Technology

Volumn 22, Issue 9, 2008, Pages 1765-1771

  No, Kee Young ^a   Kim, Gi Dae ^b   Kim, Gyu Man ^a  

^a Kyungpook National University   (South Korea)

^b Catholic University of Daegu   (South Korea)

Author keywords

3 D micro structure; Diffuser lithography; SU 8

Indexed keywords

3-D MICRO STRUCTURE; 3-DIMENSIONAL; BEAM STRUCTURES; CIRCULAR CROSS SECTIONS; DIFFERENT GEOMETRIES; DIFFUSER LITHOGRAPHY; ELLIPTICAL CROSS SECTIONS; IRREGULAR SURFACES; LITHOGRAPHY PROCESS; NEGATIVE PHOTORESISTS; PATTERN SIZES; SINGLE EXPOSURES; SPIN-COATED PHOTORESISTS; SU-8; SUPPORT STRUCTURES; THICK PHOTORESISTS; UV LIGHTS;

CHROMIUM; DIFFUSERS (FLUID); MICROSTRUCTURE; PHOTORESISTORS; PHOTORESISTS; POLYMERS; SURFACE TREATMENT;

LITHOGRAPHY;

EID: 64949108195     PISSN: 1738494X     EISSN: None     Source Type: Journal    
DOI: 10.1007/s12206-008-0601-8     Document Type: Article

References (3)

1. H. Yu, O. Balogun, B. Li, T. Murray and X. Zhang, Building embedded microchannels using single layer SU-8 and determining Young's modulus using laser acoustic technique, Proc. of micro TAS 2004, Malmo, Sweden, (2004) 73-75.
2. T. Suzuki, T. Tokuda, N. Fujiwara, H. Yamamoto, I. Kanno and M. Kotera, Single-mask fabrication process for high aspect-ratio embedded microchannels with openings, Proc. of micro TAS 2005, Boston, USA, (2005) 1183-1185.
3. S. Chang and J.-B. Yoon, 3D Diffuser lithography: a novel method to fabricate various rounded microstructure, Proc. of TRANSDUCERS'05, Seoul, Korea, (2005) 1457-1460.