Single-mask fabrication process for high aspect-ratio embedded microchannels with openings

Micro Total Analysis Systems - Proceedings of MicroTAS 2005 Conference: 9th International Conference on Miniaturized Systems for Chemistry and Life Sciences

Volumn 1, Issue , 2005, Pages 1183-1185

  Suzuki, Takaaki ^a   Tokuda, Takashi ^a   Fujiwara, Noritsugu ^a   Yamamoto, Hideo ^a   Kanno, Isaku ^a   Washizu, Masao ^b   Kotera, Hidetoshi ^a  

^a KYOTO UNIVERSITY   (Japan)

^b UNIVERSITY OF TOKYO   (Japan)

Author keywords

Double inclined UV lithography; Microchannel; Single mask; SU 8

Indexed keywords

ASPECT RATIO; CHEMICAL ANALYSIS; ELECTROPHYSIOLOGY; MASKS;

EMBEDDED MICROCHANNELS; FABRICATION METHOD; FABRICATION PROCESS; HIGH ASPECT RATIO; HIGH-DENSITY ARRAYS; INCLINED UV LITHOGRAPHY; SINGLE-MASK; SU-8;

MICROCHANNELS;

EID: 64949092876     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)

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