Comparison of the damage in sapphire due to implantation of boron, nitrogen, and iron

Journal of Nuclear Materials

Volumn 389, Issue 2, 2009, Pages 311-316

  McHargue, Carl J ^a   Alves, E ^b   Marques, C ^b   Ononye, L C ^c  

^a UNIVERSITY OF TENNESSEE   (United States)

^b INSTITUTO TECNOLÓGICO E NUCLEAR   (Portugal)

^c Department Of Cybersecurity   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

BCC IRONS; DEFECT CLUSTERS; F-TYPE CENTERS; FLUENCES; IMPLANTED SAMPLES; OPTICAL ABSORPTION MEASUREMENTS; OPTICAL ABSORPTIONS; OPTICAL SCATTERINGS; TEM;

ABSORPTION; BORON; BORON COMPOUNDS; CORUNDUM; LIGHT ABSORPTION; MICROSTRUCTURE; OPTICAL PROPERTIES; RUTHERFORD BACKSCATTERING SPECTROSCOPY; SAPPHIRE; SINGLE CRYSTALS;

NITROGEN;

EID: 64649094766     PISSN: 00223115     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jnucmat.2009.02.025     Document Type: Article

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