Crosslinking of copolymer thin films by initiated chemical vapor deposition for hydrogel applications

Thin Solid Films

Volumn 517, Issue 12, 2009, Pages 3543-3546

  Tenhaeff, Wyatt E ^a,b   Gleason, Karen K ^a,b  

^a Massachusetts Institute of Technology Cambridge   (United States)

^b MASSACHUSETTS INSTITUTE OF TECHNOLOGY   (United States)

Author keywords

Chemical vapor deposition; Polymers

Indexed keywords

2 PROPANOLS; AMIDE FUNCTIONALITIES; CDSE/ZNS; COPOLYMER THIN FILMS; CORE SHELLS; CROSS-LINKING DENSITIES; CYSTEAMINE; DIMETHYL ACRYLAMIDE; DIVINYL ETHERS; FOURIER TRANSFORM INFRA-RED SPECTROSCOPIES; FREE THIOL GROUPS; FUNCTIONALIZATION; FUNCTIONALIZED; HYDROGEL SYSTEMS; PH DEPENDENTS; SEMICONDUCTOR NANOPARTICLES; SILICON SUBSTRATES; SWELLING RATIOS; XPS;

AMIDES; CARBOXYLIC ACIDS; CHEMICAL VAPOR DEPOSITION; COPOLYMERIZATION; COUPLING AGENTS; CROSSLINKING; ETHERS; ETHYLENE; ETHYLENE GLYCOL; FOURIER TRANSFORM INFRARED SPECTROSCOPY; FOURIER TRANSFORMS; FUNCTIONAL GROUPS; MALEIC ANHYDRIDE; ORGANIC ACIDS; POLYMERS; POLYVINYL ALCOHOLS; SEMICONDUCTING SILICON COMPOUNDS; SPECTROSCOPIC ANALYSIS; THIN FILMS; VAPORS;

HYDROGELS;

EID: 64549119074     PISSN: 00406090     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.tsf.2009.01.052     Document Type: Article

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