Formation of primary amines on silicon nitride surfaces: A direct, plasma-based pathway to functionalization

Langmuir

Volumn 23, Issue 8, 2007, Pages 4400-4404

  Stine, Rory ^a   Cole, Christina L ^a,b   Ainslie, Kristy M ^a,c   Mulvaney, Shawn P ^a   Whitman, Lloyd J ^a  

^a NAVAL RESEARCH LABORATORY   (United States)

^b SMITHSONIAN INSTITUTION   (United States)

^c UNIVERSITY OF CALIFORNIA   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRONIC COMPONENTS; PRIMARY AMINES; SILICON NITRIDE SURFACES;

BIOSENSORS; PASSIVATION; PLASMA THEORY; PROTEINS; SILANES; SILICON NITRIDE; SURFACE TREATMENT;

AMINES;

AMINE; AVIDIN; BIOTIN; FLUORESCENT DYE; FLUORINE; GLUTARALDEHYDE; PROTEIN; SILICON; SILICON DERIVATIVE; SILICON NITRIDE;

AIR; ARTICLE; BIOTINYLATION; CHEMISTRY; GENETIC PROCEDURES; REPRODUCIBILITY; SPECTROMETRY; SURFACE PROPERTY;

AIR; AMINES; AVIDIN; BIOSENSING TECHNIQUES; BIOTIN; BIOTINYLATION; FLUORESCENT DYES; FLUORINE; GLUTARAL; PROTEINS; REPRODUCIBILITY OF RESULTS; SILICON; SILICON COMPOUNDS; SPECTROMETRY, X-RAY EMISSION; SURFACE PROPERTIES;

EID: 34247391588     PISSN: 07437463     EISSN: None     Source Type: Journal    
DOI: 10.1021/la0635653     Document Type: Article

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