SCOPUS 정보 검색 플랫폼

Volumn 517, Issue 13, 2009, Pages 3731-3734

Influence of annealing on thermoelectric properties of bismuth telluride films grown via radio frequency magnetron sputtering

(3) Huang, Hu a Luan, Wei ling a Tu, Shan tung a

a EAST CHINA UNIVERSITY OF SCIENCE AND TECHNOLOGY (China)

Author keywords

Annealing; Bismuth telluride; Powder target; Radio frequency magnetron sputtering; Thermoelectric films

Indexed keywords

ANNEALING TEMPERATURES; BISMUTH TELLURIDE; CRYSTAL PLANES; ELECTRICAL CONDUCTIVITIES; GRAIN SIZES; HIGH TEMPERATURE TREATMENTS; MIXED POWDERS; POWDER TARGET; POWER FACTORS; RADIO FREQUENCY MAGNETRON SPUTTERING; SPUTTERING TARGETS; THERMOELECTRIC FILMS; THERMOELECTRIC PROPERTIES;

ANNEALING; BISMUTH; CRYSTAL STRUCTURE; ELECTRIC CONDUCTIVITY; ELECTRIC POWER FACTOR; MAGNETRON SPUTTERING; MAGNETRONS; POWDERS; RADIO WAVES; SURFACE ROUGHNESS; SURFACE STRUCTURE; TARGETS; THERMOELECTRIC EQUIPMENT; THERMOELECTRICITY; X RAY DIFFRACTION ANALYSIS;

RADIO;

EID: 64349105220 PISSN: 00406090 EISSN: None Source Type: Journal
DOI: 10.1016/j.tsf.2009.01.015 Document Type: Article

Times cited : (90)

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