Impact of coma on CD control for multiphase PSM designs

Proceedings of SPIE - The International Society for Optical Engineering

Volumn 3334, Issue , 1998, Pages 15-24

  Schmidt, Regina T ^a   Spence, Chris A ^a   Capodieci, Luigi ^a   Krivokapic, Zoran ^a   Geh, Bernd ^b   Flagello, Donis G ^c  

^a ADVANCED MICRO DEVICES   (United States)

^b CARL ZEISS SMT AG   (Germany)

^c ASML   (Netherlands)

Author keywords

Aberrations; Across field CD control; Alternating PSM; Electrical linewidth; Simulation

Indexed keywords

ABERRATIONS; DATA STORAGE EQUIPMENT; DESIGN; MASKS;

ACROSS FIELD CD CONTROL; AERIAL IMAGING; ALTERNATING PSM; BINARY MASKS; DEFOCUS; ELECTRICAL LINEWIDTH; PARTIAL-COHERENCE; POLY GATES; SIMULATION;

PULSE MODULATION;

EID: 0001979042     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.310750     Document Type: Conference Paper

References (4)

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3. T. A. Brunner, "Impact of Lens Aberrations on Optical Lithography" IBM J Res Dev Vol. 41 1/2, pp57-67, 1997
4. H. Liu, L. Karklin, and Y. T. Wang, "Lithographic Performance Improvements by Design Optimization of Alternating Phase-Shifting Mask" (to be published) Proc. SPIE Vol. 3236, 1997