Destruction of chlorodifluoromethane (CHF2Cl) by using dielectric barrier discharge plasma

IEEE Transactions on Plasma Science

Volumn 37, Issue 3, 2009, Pages 449-455

  Mok, Young Sun ^a   Lee, Sang Baek ^a   Chang, Myung Shik ^b  

^a Jeju National University   (South Korea)

^b Fine Semitech Corporation   (South Korea)

Author keywords

Atmospheric pressure plasma reactor; Chlorodifluoromethane; Dielectric barrier

Indexed keywords

ATMOSPHERIC CHEMISTRY; ATMOSPHERIC PRESSURE; CHLOROFLUOROCARBONS; DIELECTRIC DEVICES; ELECTRIC DISCHARGES; FLOW CONTROL; FOURIER TRANSFORM INFRARED SPECTROSCOPY; FOURIER TRANSFORMS; OXYGEN; PLASMA APPLICATIONS; PLASMA SOURCES; SPECTROSCOPIC ANALYSIS;

ATMOSPHERIC PRESSURE PLASMA REACTOR; CHEMICAL MECHANISMS; CHLORODIFLUOROMETHANE; CL-CONCENTRATIONS; DESTRUCTION EFFICIENCIES; DIELECTRIC BARRIER; DIELECTRIC BARRIER DISCHARGE PLASMAS; DIELECTRIC BARRIER DISCHARGE REACTORS; FOURIER TRANSFORM INFRA-RED SPECTROSCOPIES; GAS-FLOW RATES; INITIAL CONCENTRATIONS; INPUT POWER; NONTHERMAL ATMOSPHERIC PRESSURE PLASMAS; OXYGEN CONTENTS; REACTIVE SPECIES;

TABLE LOOKUP;

EID: 63449121290     PISSN: 00933813     EISSN: None     Source Type: Journal    
DOI: 10.1109/TPS.2008.2011800     Document Type: Article

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