Effect of sputtering parameters on surface morphology and catalytic efficiency of thin platinum films

Applied Surface Science

Volumn 255, Issue 13-14, 2009, Pages 6479-6486

  Slavcheva, E ^a,b   Ganske, G ^a   Topalov, G ^b   Mokwa, W ^a   Schnakenberg, U ^a  

^a RWTH AACHEN UNIVERSITY   (Germany)

^b BULGARIAN ACADEMY OF SCIENCES   (Bulgaria)

Author keywords

Electrocatalysis; Oxygen reduction; Sputtered Pt films

Indexed keywords

ARGON; CATALYST ACTIVITY; CYCLIC VOLTAMMETRY; ELECTROCATALYSIS; ELECTROLYTIC REDUCTION; FILM THICKNESS; METALLIC FILMS; PLATINUM; POLARIZATION; SCANNING ELECTRON MICROSCOPY; SOLUTIONS; SPUTTERING; X RAY DIFFRACTION;

CATALYTIC EFFICIENCIES; COLUMNAR STRUCTURES; ELECTROCHEMICAL METHODS; OXYGEN REDUCTION; PT FILMS; SPUTTERING PARAMETERS; SPUTTERING PRESSURES; SURFACE STRUCTURE AND MORPHOLOGIES;

THIN FILMS;

EID: 63449093495     PISSN: 01694332     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.apsusc.2009.02.033     Document Type: Article

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