Electrochemical Properties and Applications of Sputtered Iridium Oxide Thin Films

Passivation of Metals and Semiconductors, and Properties of Thin Oxide Layers

Volumn , Issue , 2006, Pages 729-735

  Slavcheva, Evelina P ^a   Schnakenberg, Uwe ^b   Mokwa, Wilfried ^b  

^a BULGARIAN ACADEMY OF SCIENCES   (Bulgaria)

^b RWTH AACHEN UNIVERSITY   (Germany)

Author keywords

[No Author keywords available]

Indexed keywords

EID: 84882883780     PISSN: None     EISSN: None     Source Type: Book    
DOI: 10.1016/B978-044452224-5/50111-6     Document Type: Chapter

References (14)

1. De Pauli C.P., Trasatti S. J. Electroanal. Chem. 1995, 369:161.
2. Da Silva L.A., Alves V.A., Da Silva M.A.P., Trasatti S., Boodts J.F.C. Electrochimica Acta 1997, 42:272.
3. Pauporte T., Andolfatto F., Durand R. Electrochimica Acta 1999, 45:431.
4. De Lima-Neto Electrochimica Acta 2000, 45:4467.
5. Rasten E., Hagen G., Tundol R. Electrochimica Acta 2003, 48:3945.
6. Santana M.H.P., De Faria L.A., Boodts J.F.C. Electrchimica Acta 2004, 49:1925.
7. Da Silva L.M., Franco D.V., De Faria L.A., Boodts J.F.C. Electrchimica Acta 2004, 49:3977.
8. Lee I.S., Whang S.N., Park J.C., Lee D.H., Seo W.S. Biomaterials 2003, 24:2225.
9. Slavcheva E., Vitushinsky R., Mokwa W., Schnakenberg U. J. Electrochem. Soc. 2004, 151(7):E226.
10. Zhu S., Wang F. J. of Appl. Phys. 1998, 84:6399.
11. Klein J.D., Clauson S.L., Cogan S.F. J. Mat. Res. 1989, 4:1505.
12. Silva T.M., Rito J.E., Simoes A.M.P., Ferreira M.G.S., da Cunha Belo M., Watkins K.G. Electrochem. Acta 1998, 43:203.
13. Levine S., Smith A.L. Discuss. Faraday Soc. 1967, 52:1290.
14. Krastajic N., Trasatti S. J Appl. Electrochem. 1998, 28:1291.