Novel surface modification of indium-tin-oxide films using ion implantation for organic light-emitting diodes

Japanese Journal of Applied Physics, Part 1: Regular Papers and Short Notes and Review Papers

Volumn 43, Issue 8 A, 2004, Pages 5516-5519

  Choi, Nack Bong ^a   Lee, Kwang Yeon ^a   Yang, Myong Su ^a   Kim, Chang Dong ^a  

^a LG Display Co Ltd   (South Korea)

Author keywords

Boron; Indium tin oxide; Ion implantation; Organic light emitting diodes; Resistance

Indexed keywords

ANNEALING; ATOMIC FORCE MICROSCOPY; BORON; ELECTRIC CURRENTS; INDIUM COMPOUNDS; ION IMPLANTATION; LIGHT EMITTING DIODES; LIQUID CRYSTAL DISPLAYS; SECONDARY ION MASS SPECTROMETRY; SURFACE ROUGHNESS;

HIGHEST OCCUPIED MOLECULAR ORBITAL (HOMO); HOLE INJECTION LAYER (HIL); INDIUM-TIN-OXIDE (ITO); PLASMA DISPLAY PANELS (PDP);

THIN FILMS;

EID: 6344287636     PISSN: 00214922     EISSN: None     Source Type: Journal    
DOI: 10.1143/JJAP.43.5516     Document Type: Article

References (9)

1. C. W. Tang and S. A. VanSlyke: Appl. Phys. Lett. 51 (1987) 913.
2. A. R. Span: Doctoral Thesis, Princeton Univ. Chemistry (2001).
3. Y. Park, V. Choong, Y. Gao, B. R. Heieh and C. W. Tang: Appl. Phys. Lett. 68 (1996) 2699.
4. C. K. Chan: Princeton Univ. Electrical Engineering (2001).
5. K. Furukawa, Y. Terasaki, H. Ueda and M. Matsumura: Synth. Met. 91 (1997) 99.
6. D. J. Milliron, I. G. Hill, C. Shen, A. Kahn and J. Schwartz: J. Appl. Phys. 87 (2000) 572.
7. J. S. Kim, M. Granstrom, R. H. Friend, N. Johansson, W. K. Salaneck, R. Daik, W. J. Feast and F. Cacialli: J. Appl. Phys. 84 (1998) 6859.
8. Y. Hashimoto, M. Hamagaki and T. Sakakibara: Jpn. J. Appl. Phys. 40 (2001) 4720.
9. D. B. Fraser and H. D. Cook: J. Electrochem. Soc. 119 (1972) 1368.