Microstructual investigation of polycrystalline silicon thin films re-crystalized by laser-diode

Proceedings of the 3rd World Conference on Photovoltaic Energy Conversion

Volumn B, Issue , 2003, Pages 1251-1254

  Oka, Fumihito ^a   Muramatsu, Shin Ichi ^a  

^a HITACHI CABLE LTD   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRON BACKSCATTERED DIFFRACTION MEASUREMENT (EBSD); LASER DIODE LIGHT;

CRYSTAL ORIENTATION; CRYSTALLIZATION; ELECTRON DIFFRACTION; GRAIN SIZE AND SHAPE; MICROSTRUCTURE; POLYCRYSTALLINE MATERIALS; POLYSILICON; SEMICONDUCTOR LASERS;

THIN FILMS;

EID: 6344258585     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (5)

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2. Motohiro Ozawa, Chang-ho Oh and Masakiyo Matumura: Jpn. J. Appl. Phys.Vol.38 (1999) 5700
3. James S. Im, Robert S. Sposili, and M. A. Crowder: Appl. Phys. Lett.70 (1997) 3434
4. G.Andra, J.Bergmann, F.Falk, E. Ose: Thin Solid Films 318 (1998) 42.
5. G.Andra, J.Bergmann, F.Falk, E.Ose, N. D. Sinn: Technical Digest of the International PVSEC-11 (1999) 741