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Applied Physics A: Materials Science and Processing

Volumn 79, Issue 8, 2004, Pages 1839-1842

Diffusion-limited photopolymerization in scanning micro-stereolithography

(3) Fang, N a Sun, C a Zhang, X a

a UNIVERSITY OF CALIFORNIA (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ADSORPTION; ALGORITHMS; COMPUTER AIDED DESIGN; COMPUTER SIMULATION; DIFFUSION; ETHERS; FLUXES; FUNCTIONS; MATHEMATICAL MODELS; PHOTONS; PHOTOPOLYMERIZATION; PULSED LASER APPLICATIONS; REACTION KINETICS; SOLUTIONS; ULTRAVIOLET RADIATION;

MICROSTEREOLITHOGRAPHY; PHOTOINITIATORS; PHOTONIC BAND GAPS; PULSED LASER CURING;

STEREOCHEMISTRY;

EID: 6344256428 PISSN: 09478396 EISSN: None Source Type: Journal
DOI: 10.1007/s00339-004-2938-x Document Type: Article

Times cited : (62)

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