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Volumn B, Issue , 2003, Pages 1605-1610

0.5μm-thick μc-Si solar cell grown by photo-cvd on highly textured SnO2

Author keywords

[No Author keywords available]

Indexed keywords

CARBON IMPURITIES; CRYSTAL VOLUME FRACTIONS; DEPOSITION SYSTEMS; MICROCRYSTALLINE SILICON;

EID: 6344239199     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (6)

References (5)
  • 2
    • 0038527172 scopus 로고    scopus 로고
    • Highly conductive microcrystalline silicon carbide films deposited by the hot wire cell method and its appliaction to amorphous silicon solar cells
    • in press
    • S.Miyajima, A.Yamada and M.Konagai, "Highly Conductive Microcrystalline Silicon Carbide Films Deposited by the Hot Wire Cell Method and Its Appliaction to Amorphous Silicon Solar Cells", Thin Solid Films (2003) in press.
    • (2003) Thin Solid Films
    • Miyajima, S.1    Yamada, A.2    Konagai, M.3
  • 5
    • 0035896783 scopus 로고    scopus 로고
    • Passivation of oxygen-related donors in microcrystalline silicon by low temperature deposition
    • Y.Nasuno, M.Kondo and A.Matsuda, "Passivation of oxygen-related donors in microcrystalline silicon by low temperature deposition", Appl.Phys.Lett., 78 (2001) 2330
    • (2001) Appl.Phys.Lett. , vol.78 , pp. 2330
    • Nasuno, Y.1    Kondo, M.2    Matsuda, A.3


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.