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Volumn B, Issue , 2003, Pages 1262-1264

Thin silicon cells using novel LASE process

Author keywords

[No Author keywords available]

Indexed keywords

LOW PRESSURE CHEMICAL VAPOR DEPOSITION (LPCVD); SILICON DEPOSITION; THIN FILM SILICON PHOTOVOLTAICS;

EID: 6344238962     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper
Times cited : (4)

References (9)
  • 1
  • 2
    • 0000398235 scopus 로고    scopus 로고
    • A review of thin film crystalline silicon for solar cell applications: Part 2 - Foreign substrates
    • K.R. Catchpole, M.McCann, K.J. Weber and A.W. Blakers, "A Review of Thin Film Crystalline Silicon for Solar Cell Applications: Part 2 - Foreign Substrates", Solar Energy Materials and Solar Cells 68, 173 (2001)
    • (2001) Solar Energy Materials and Solar Cells , vol.68 , pp. 173
    • Catchpole, K.R.1    McCann, M.2    Weber, K.J.3    Blakers, A.W.4
  • 8
    • 6344222428 scopus 로고    scopus 로고
    • Semiconductor processing
    • PCT/AU02/01640 (Nov.)
    • K.J. Weber and A.W. Blakers, PCT application, "Semiconductor Processing", PCT/AU02/01640 (Nov. 2002)
    • (2002) PCT Application
    • Weber, K.J.1    Blakers, A.W.2


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.