Nano-bending method to identify the residual stresses of MEMS films

2003 Nanotechnology Conference and Trade Show - Nanotech 2003

Volumn 1, Issue , 2003, Pages 468-473

  Kim, Jong Hoon ^a   Kim, Jeong Gil ^a   Hahn, Jun Hee ^b   Lee, H Y ^a   Kim, Yong Hyup ^a  

^a Seoul National University   (South Korea)

^b Division of Chemical Metrology and Materials Evaluation   (South Korea)

Author keywords

MEMS; Nano indenter; Poly silicon; Residual stress; Thin film

Indexed keywords

MATHEMATICAL MODELS; MICROMACHINING; MONOCHROMATORS; POLYSILICON; RESIDUAL STRESSES; STIFFNESS; THIN FILMS;

BENDING STIFFNESS; ELECTRICAL COMPONENTS; MECHANICAL AMPLIFIERS; NANO-IDENTERS;

MICROELECTROMECHANICAL DEVICES;

EID: 6344238937     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (7)

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