Optical absorption in μc-Si:H films induced by oxygen

Proceedings of the 3rd World Conference on Photovoltaic Energy Conversion

Volumn B, Issue , 2003, Pages 1683-1686

  Kunii, T ^a   Kiriyama, T ^a   Mori, K ^a   Yoshida, N ^a   Nonomura, S ^a  

^a GIFU UNIVERSITY   (Japan)

Author keywords

[No Author keywords available]

Indexed keywords

ABSORPTION COEFFICIENTS; CRYSTALLINITY; EXTRA OPTICAL ABSORPTION; TEMPERATURE DEPENDENCES;

CONTAMINATION; NATURAL FREQUENCIES; OXIDATION; OXYGEN; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; RAMAN SPECTROSCOPY; SEMICONDUCTING SILICON; THIN FILMS;

LIGHT ABSORPTION;

EID: 6344228521     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

References (4)

1. T. Kunii et al., Solar Energy Materials & Solar Cells, 74 (2002) 415.
2. T. Kunii et al., Review of Scientific Instruments, 74,1 (2003) 881.
3. G. Lucovsky, Solid State Commun., 3 (1965) 299.
4. S.M.Sze, Physics of Semiconductor Devices 2nd ed., John Wiley & Sons (USA, New York, 1981)42.