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Volumn , Issue , 2008, Pages

Region of nearly constant off current versus gate length characteristics for sub-0.1 μm low power CMOS technology

Author keywords

[No Author keywords available]

Indexed keywords

CMOS INTEGRATED CIRCUITS; SOLID STATE DEVICES; THRESHOLD VOLTAGE; TRANSISTOR TRANSISTOR LOGIC CIRCUITS;

EID: 63249090042     PISSN: None     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1109/EDSSC.2008.4760689     Document Type: Conference Paper
Times cited : (3)

References (7)
  • 1
    • 13844275618 scopus 로고    scopus 로고
    • In search of forever continued transistor scaling one new material at a time
    • S.E. Thompson, R.S. Chau, T. Ghani, K. Mistry, "In search of forever continued transistor scaling one new material at a time," IEEE Trans. Semi. Manuf., vol. 18, p. 26, 2005.
    • (2005) IEEE Trans. Semi. Manuf , vol.18 , pp. 26
    • Thompson, S.E.1    Chau, R.S.2    Ghani, T.3    Mistry, K.4
  • 3
    • 0142185181 scopus 로고    scopus 로고
    • eff extraction for sub-100 nm MOSFET devices
    • eff extraction for sub-100 nm MOSFET devices," Solid-State Electron., vol. 48, p. 163, 2004.
    • (2004) Solid-State Electron , vol.48 , pp. 163
    • Ye, Q.1    Biesemans, S.2
  • 4
    • 0028746293 scopus 로고
    • A 0.1 μm CMOS technology with tilt-implanted punchthrough stopper (TIPS)
    • T. Hori, "A 0.1 μm CMOS technology with tilt-implanted punchthrough stopper (TIPS)", IEDM Tech. Dig., p. 75, 1994.
    • (1994) IEDM Tech. Dig , pp. 75
    • Hori, T.1
  • 7
    • 0001351807 scopus 로고
    • VLSI limitations from drain-induced barrier lowering
    • R. R. Troutman, "VLSI limitations from drain-induced barrier lowering," IEEE Journal of Solid-State Circuits, vol. 14, p. 383, 1979.
    • (1979) IEEE Journal of Solid-State Circuits , vol.14 , pp. 383
    • Troutman, R.R.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.