Regrowth kinetics of self-amorphized germanium and evolution of implant damage

ECS Transactions

Volumn 16, Issue 10, 2009, Pages 229-232

  Koffel, S ^a   Scheiblin, P ^a   Claverie, A ^b  

^a CEA LETI   (France)

^b CEMES CNRS   (France)

Author keywords

[No Author keywords available]

Indexed keywords

GERMANIUM COMPOUNDS; HIGH RESOLUTION TRANSMISSION ELECTRON MICROSCOPY; SI-GE ALLOYS;

ACCURATE MEASUREMENT; AMORPHOUS GERMANIUM; END-OF-RANGE DEFECTS; IMPLANT DAMAGE; SOLID PHASE EPITAXIAL REGROWTH;

GERMANIUM METALLOGRAPHY;

EID: 63149162782     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.2986775     Document Type: Conference Paper

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