High performance short channel a-Si:H TFT device with Cu electrodes

ECS Transactions

Volumn 16, Issue 9, 2009, Pages 13-21

  Yang, J Y ^a   Ahn, Y K ^a   Bang, J H ^a   Ryu, W S ^a   Kim, J O ^a   Kang, Y K ^a   Yang, M S ^a   Kang, I B ^a   Cung, I J ^a  

^a LG Display Co Ltd   (South Korea)

Author keywords

[No Author keywords available]

Indexed keywords

ELECTRODES; FIELD EFFECT TRANSISTORS; MASKS; PLASMA APPLICATIONS; THIN FILM CIRCUITS; THIN FILMS; THRESHOLD VOLTAGE;

CHANNEL LENGTH; CU ELECTRODE; GATE INSULATOR; HYDROGEN PLASMA TREATMENTS; MASK PATTERNS; OFF CURRENT; PLASMA ETCH PROCESS; SHORT CHANNELS;

THIN FILM TRANSISTORS;

EID: 63149108668     PISSN: 19385862     EISSN: 19386737     Source Type: Conference Proceeding    
DOI: 10.1149/1.2980526     Document Type: Conference Paper

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