Optimization of stressor layers created by ClusterCarbon™ implantation

Materials Research Society Symposium Proceedings

Volumn 1070, Issue , 2008, Pages 177-183

  Sekar, Karuppanan ^a   Krull, Wade A ^a   Horsky, Thomas N ^a  

^a Ceradyne Inc   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CARBON; LEAKAGE CURRENTS; SILICON; SILICON CARBIDE; TENSILE STRAIN; X RAY DIFFRACTION ANALYSIS;

DEVICE PERFORMANCE; END-OF-RANGE DEFECTS; ENHANCED MOBILITY; HIGH-RESOLUTION X-RAY DIFFRACTION; NMOS TRANSISTORS; PRE-AMORPHIZING IMPLANTS; SELF-AMORPHIZATION; SOLID PHASE EPITAXIAL REGROWTH;

SILICON COMPOUNDS;

EID: 62949200388     PISSN: 02729172     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1557/proc-1070-e04-08     Document Type: Conference Paper

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