Deposition and characterization of diamond protective coatings on WC-Co cutting tools

Ceramic Engineering and Science Proceedings

Volumn 29, Issue 4, 2009, Pages 69-74

  Tang, Y ^a   Yang, S L ^a   Yi, W W ^a   Yang, Q ^a   Li, Y S ^a   Hirose, A ^a   Wei, R ^b  

^a UNIVERSITY OF SASKATCHEWAN   (Canada)

^b SOUTHWEST RESEARCH INSTITUTE   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

CERAMIC COATINGS; CERAMIC MATERIALS; COBALT; COMPOSITE COATINGS; CUTTING TOOLS; DIAMOND FILMS; DIAMONDS; GRAPHITE; HYDROCHLORIC ACID; HYDROGEN; MICROWAVES; PHASE INTERFACES; PLASMA DEPOSITION; PLASMA ENHANCED CHEMICAL VAPOR DEPOSITION; PLASMA ETCHING; PLASMAS; PROTECTIVE COATINGS; SUBSTRATES; SURFACE TREATMENT; TUNGSTEN ALLOYS; TUNGSTEN CARBIDE;

CATALYTIC EFFECTS; CHARACTERISTIC PEAKS; CO CONCENTRATIONS; COBALT BINDER PHASE; DIAMOND COATINGS; DIAMOND PEAKS; GRAPHITE FORMATIONS; HYDROGEN-PLASMA ETCHINGS; MICROWAVE PLASMAS; NANOCRYSTALLINE DIAMOND COATINGS; PHASE CONTENTS; PLASMA TREATMENTS; PRE-TREATMENTS; RAMAN SPECTRUM; SCRATCHING TESTS; SEM; SUBSTRATE PRETREATMENT; SUBSTRATE SURFACE MORPHOLOGIES;

DIAMOND CUTTING TOOLS;

EID: 62849085579     PISSN: 01966219     EISSN: None     Source Type: Conference Proceeding    
DOI: None     Document Type: Conference Paper

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