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Volumn 6730, Issue , 2007, Pages

Advanced mask particle cleaning solutions

Author keywords

[No Author keywords available]

Indexed keywords

ASPECT RATIO; CRYOGENICS; NANOPARTICLES; REPAIR; SEMICONDUCTOR DEVICE MANUFACTURE; SURFACE CLEANING;

EID: 42149191431     PISSN: 0277786X     EISSN: None     Source Type: Conference Proceeding    
DOI: 10.1117/12.746748     Document Type: Conference Paper
Times cited : (10)

References (4)
  • 2
    • 25444460865 scopus 로고    scopus 로고
    • Principles and Mechanisms of Sub-Micrometer Particle Removal by CO2 Cryogenic Technique
    • Souvik Banerjee, Andrea Campbell, "Principles and Mechanisms of Sub-Micrometer Particle Removal by CO2 Cryogenic Technique", Journal of Adhesion Science and Technology, Volume 19, Number 9, 2005, pp. 739-751(13), http://www1.boc.com/eco-snow/pdf/Journal_of_Adhesion_Science_and_Tech.PDF.
    • (2005) Journal of Adhesion Science and Technology , vol.19 , Issue.9-13 , pp. 739-751
    • Banerjee, S.1    Campbell, A.2
  • 3
    • 42149184159 scopus 로고    scopus 로고
    • Semiconductor International, Aug 31
    • Peter Singer, "Group of 10 to Attack Killer Particles", Semiconductor International, Aug 31, 2007, http://www.semiconductor.net/article/ CA6473664.html.
    • (2007) Group of 10 to Attack Killer Particles
    • Singer, P.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.