Controlled modification of erbium lifetime by near-field coupling to metallic films

New Journal of Physics

Volumn 11, Issue , 2009, Pages

  Yu, Nanfang ^a   Belyanin, Alexey ^b   Bao, Jiming ^a,c   Capasso, Federico ^a  

^a HARVARD UNIVERSITY   (United States)

^b TEXAS A AND M UNIVERSITY   (United States)

^c UNIVERSITY OF HOUSTON   (United States)

Author keywords

[No Author keywords available]

Indexed keywords

ERBIUM; SILICON COMPOUNDS;

CONTROLLED MODIFICATIONS; DEGREE OF CONTROLS; DIRECT GENERATIONS; ERBIUM IONS; IMPLANTATION ENERGIES; IMPLANTED MATERIALS; METAL OVERLAYERS; NEAR-FIELD COUPLINGS; NEAR-FIELD INTERACTIONS; OVERLAYERS; PHOTOLUMINESCENCE LIFETIMES; RADIATIVE EFFICIENCIES; RADIATIVE PROPERTIES; SURFACE PLASMON POLARITONS; THEORETICAL MODELING;

SUGAR (SUCROSE);

EID: 62549157365     PISSN: 13672630     EISSN: None     Source Type: Journal    
DOI: 10.1088/1367-2630/11/1/015003     Document Type: Article

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