Ultralow-threshold erbium-implanted toroidal microlaser on silicon

Applied Physics Letters

Volumn 84, Issue 7, 2004, Pages 1037-1039

  Polman, A ^a,b   Min, B ^a   Kalkman, J ^b   Kippenberg, T J ^a   Vahala, K J ^a  

^a California Institute of Technology   (United States)

^b FOM INSTITUTE AMOLF   (Netherlands)

Author keywords

[No Author keywords available]

Indexed keywords

LASER ANNEALING; MICROLASERS;

ANNEALING; CARBON DIOXIDE LASERS; DOPING (ADDITIVES); DRY ETCHING; ERBIUM; IMAGE ANALYSIS; ION IMPLANTATION; LASER RESONATORS; PHOTOLITHOGRAPHY; PUMPING (LASER); SCANNING ELECTRON MICROSCOPY; SILICON; SILICON WAFERS; SINGLE MODE FIBERS; SOL-GELS;

LASER OPTICS;

EID: 1542785037     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.1646748     Document Type: Article

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