Effect of UV laser conditioning on fused silica in vacuum

Optical Materials

Volumn 31, Issue 6, 2009, Pages 1013-1016

  Xu, Shizhen ^a,b   Yuan, Xiaodong ^b   Yin, Wei ^a   Xiang, Xia ^a   Zu, Xiaotao ^a  

^a UNIVERSITY OF ELECTRONIC SCIENCE AND TECHNOLOGY OF CHINA   (China)

^b RESEARCH CENTER OF LASER FUSION   (China)

Author keywords

Fused silica; Laser conditioning; Laser induced damage threshold; Nd:YLF laser; Vacuum

Indexed keywords

LASER DAMAGE; ULTRAVIOLET LASERS; VACUUM; YLF LASERS;

DAMAGE TESTING; DAMAGE THRESHOLD; IN-VACUUM; LASER CONDITIONING; LASER INDUCED DAMAGE THRESHOLDS; ND:YLF LASER; RASTER SCANS; UV LASERS;

FUSED SILICA;

EID: 62549136942     PISSN: 09253467     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.optmat.2008.11.016     Document Type: Article

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