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Volumn 615 617, Issue , 2009, Pages 117-120

Extended study of the step-bunching mechanism during the homoepitaxial growth of SiC

Author keywords

Step bunching; Step controlled epitaxy; Surface morphologies

Indexed keywords

ATOMIC FORCE MICROSCOPY; INTELLIGENT SYSTEMS; MONTE CARLO METHODS; SURFACE ANALYSIS; SURFACE MORPHOLOGY;

EID: 62549119579     PISSN: 02555476     EISSN: 16629752     Source Type: Book Series    
DOI: 10.4028/www.scientific.net/MSF.615-617.117     Document Type: Conference Paper
Times cited : (2)

References (10)
  • 10
    • 0014464613 scopus 로고
    • doi:10.1063/1.1657442
    • R. L. Schwoebel: J. Appl. Phys. Vol. 40 (1969), p. 614 doi:10.1063/1.1657442.
    • (1969) J. Appl. Phys. , vol.40 , pp. 614
    • Schwoebel, R.L.1


* 이 정보는 Elsevier사의 SCOPUS DB에서 KISTI가 분석하여 추출한 것입니다.