Crystallization of amorphous Si film by microwave annealing with SiC susceptors

Applied Physics Letters

Volumn 94, Issue 10, 2009, Pages

  Fong, S C ^a   Wang, C Y ^b   Chang, T H ^a   Chin, T S ^a,c  

^a NATIONAL TSING HUA UNIVERSITY   (Taiwan)

^b INDUSTRIAL TECHNOLOGY RESEARCH INSTITUTE   (Taiwan)

^c FENG CHIA UNIVERSITY   (Taiwan)

Author keywords

[No Author keywords available]

Indexed keywords

METALLIC FILMS; MICROWAVE IRRADIATION; SEMICONDUCTING SILICON COMPOUNDS; SILICON CARBIDE; THIN FILM TRANSISTORS;

AMORPHOUS SI FILMS; AMORPHOUS SILICON FILMS; ANNEALING TEMPERATURES; CRYSTALLINE SILICON FILMS; FAST PROCESSING TIME; GLASS SUBSTRATES; LOW TEMPERATURES; MICROWAVE ANNEALING; MICROWAVE APPLICATORS; SHORT PERIODS; SI-BASED DEVICES; SUSCEPTORS;

AMORPHOUS SILICON;

EID: 62549097802     PISSN: 00036951     EISSN: None     Source Type: Journal    
DOI: 10.1063/1.3097019     Document Type: Article

References (14)

1. G. Harbeke, L. Krausbauer, E. F. Steigmeier, and A. E. Widmer, Appl. Phys. Lett. 0003-6951 10.1063/1.93904 42, 249 (1983).
2. R. B. Iverson and R. Reif, J. Appl. Phys. 0021-8979 10.1063/1.339591 62, 1675 (1987).
3. S. Yamaguchi, N. Sugii, S. K. Park, K. Nakagawa, and M. Miyao, J. Appl. Phys. 0021-8979 10.1063/1.1344215 89, 2091 (2001).
4. A. Nakamura, F. Emoto, E. Fujii, A. Yamamoto, Y. Uemoto, K. Senda, and G. Kano, J. Appl. Phys. 0021-8979 10.1063/1.343965 66, 4248 (1989).
5. Y. Sugawara, Y. Uraoka, H. Yano, T. Hatayama, T. Fuyuki, and A. Mimura, IEEE Electron Device Lett. 28, 395 (2007). 0741-3106
6. L. Pereira, H. A. Guas, R. M. S. Martinas, P. Vilarinho, E. Fortunato, and R. Martins, Thin Solid Films 334, 451 (2004).
7. S. W. Lee, Y. C. Jeon, and S. K. Joo, Appl. Phys. Lett. 0003-6951 10.1063/1.113888 66, 1671 (1995).
8. M. Shahidul Haque, H. A. Naseem, and W. D. Brown, J. Appl. Phys. 0021-8979 10.1063/1.356039 75, 3928 (1994).
9. J. Y. Wang, D. He, Y. H. Zhao, and E. J. Mittemeijer, Appl. Phys. Lett. 0003-6951 10.1063/1.2172707 88, 061910 (2006).
10. Z. Jin, G. A. Bhat, M. Yeung, H. S. Kwok, and M. Wong, J. Appl. Phys. 0021-8979 10.1063/1.368016 84, 194 (1998).
11. J. H. Ahn, J. N. Lee, Y. C. Kim, and B. T. Ahn, Curr. Appl. Phys. 2, 135 (2002). 1567-1739
12. J. W. Park, D. G. Moon, B. T. Ahn, H. B. Im, and K. R. Lee, Thin Solid Films 0040-6090 10.1016/0040-6090(94)90895-8 245, 174 (1994).
13. H. Zhang, J. Zhang, and H. Zhang, MRS Bull. 41, 1279 (2006). 0883-7694
14. W. C. Dunlap, J. R. Watters, and R. L. Watters, Phys. Rev. 92, 1396 (1953).