Effects of radio-frequency sputtering powers on the microstructures and electrochemical properties of LiCoO2 thin film electrodes

Journal of Power Sources

Volumn 189, Issue 1, 2009, Pages 633-637

  Pan, Huaijian ^a,b   Yang, Yong ^a  

^a XIAMEN UNIVERSITY   (China)

^b BINZHOU UNIVERSITY   (China)

Author keywords

As deposited thin film; LiCoO2 thin film; RF sputtering technique; Thin film battery

Indexed keywords

ELECTRIC DISCHARGES; ELECTROCHEMICAL PROPERTIES; ELECTRODEPOSITION; ELECTRODES; ELECTRON ENERGY LOSS SPECTROSCOPY; LITHIUM COMPOUNDS; SCANNING ELECTRON MICROSCOPY; THIN FILM DEVICES; THIN FILMS;

ANNEALING PROCESS; AS-DEPOSITED FILMS; AS-DEPOSITED THIN FILM; CHARGE-DISCHARGE EXPERIMENTS; CHARGE-DISCHARGE PERFORMANCE; ELECTROCHEMICAL PERFORMANCE; LICOO2 THIN FILM; RADIO-FREQUENCY SPUTTERING; RAMAN SCATTERING SPECTROSCOPIES; RF SPUTTERING TECHNIQUE; SEM; SPUTTERING POWER; TARGET MATERIALS; THIN FILM BATTERY; THIN-FILM ELECTRODES; X-RAY DIFFRACTIONS;

VAPOR DEPOSITION;

EID: 62349114460     PISSN: 03787753     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.jpowsour.2008.09.065     Document Type: Article

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