Two-step growth of HFCVD diamond films over large areas

Vacuum

Volumn 83, Issue 7, 2009, Pages 1054-1056

  Amorim, A ^a,b   Nascente, P A P ^c   Trava Airoldi, V J ^d   Corat, E J ^d   Alves, A R ^a   Moro, J R ^a  

^a UNIVERSIDADE SÃO FRANCISCO   (Brazil)

^b FATEC   (Brazil)

^c FEDERAL UNIVERSITY OF SÃO CARLOS   (Brazil)

^d INSTITUTO NACIONAL DE PESQUISAS ESPACIAIS   (Brazil)

Author keywords

Diamond; HFCVD; Large area; Two step growth

Indexed keywords

CHEMICAL VAPOR DEPOSITION; DIAMOND CUTTING TOOLS; DIAMONDS; ELECTRODEPOSITION; SCANNING ELECTRON MICROSCOPY; X RAY PHOTOELECTRON SPECTROSCOPY;

CVD DIAMONDS; DIAMOND LAYERS; HFCVD; HFCVD DIAMONDS; HOT-FILAMENT CHEMICAL VAPOR DEPOSITIONS; LARGE AREA; RAMAN SCATTERING SPECTROSCOPIES; SATURATED SOLUTIONS; SEM; SI (100) SUBSTRATES; TWO-STEP GROWTH; X-RAY PHOTOELECTRON SPECTROSCOPIES;

DIAMOND FILMS;

EID: 61849128860     PISSN: 0042207X     EISSN: None     Source Type: Journal    
DOI: 10.1016/j.vacuum.2008.11.013     Document Type: Article

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